AUTHOR=Huang Hao , Lv Weibiao , Chen Ying , Zheng Xiufeng , Hu Yong , Wang Ruihua , Huang Meiling , Tang Hongfeng 

TITLE=The Role of NADPH Oxidase in the Inhibition of Trichophyton rubrum by 420-nm Intense Pulsed Light

JOURNAL=Frontiers in Microbiology

VOLUME=8

YEAR=2018

URL=https://www.frontiersin.org/journals/microbiology/articles/10.3389/fmicb.2017.02636

DOI=10.3389/fmicb.2017.02636

ISSN=1664-302X

ABSTRACT=<p><bold>Objectives:</bold> To evaluate the effect of intense pulsed light (IPL) on <italic>Trichophyton rubrum</italic> and investigate its mechanism of action.</p><p><bold>Methods:</bold> The viability of fungi treated with IPL alone and with IPL combined with an NADPH oxidase inhibitor (DPI) pretreatment was determined by MTT assays. The reactive oxygen species (ROS) were quantified with a DCFH-DA fluorescent probe. Malondialdehyde (MDA) content and superoxide dismutase (SOD) and glutathione peroxidase (GSH-Px) activities were determined by commercial kits. The transcription of the Nox gene was quantified using quantitative real-time PCR (qRT-PCR) analysis, and micromorphology was observed using scanning electron microscopy (SEM). In addition, fungal keratinase activity was detected by measuring dye release from keratin azure.</p><p><bold>Results:</bold> The growth declined with statistical significance after 6 h of treatment (<italic>P</italic> &lt; 0.001). The ROS and MDA content increased after IPL treatment, whereas the SOD and GSH-Px activity decreased. Nox gene expression was upregulated, and the micromorphology was damaged. Keratinase activity decreased. Fungi that received DPI pretreatment exhibited contrasting outcomes.</p><p><bold>Conclusion:</bold> We found that 420-nm IPL significantly inhibited the growth and pathogenicity of <italic>T. rubrum in vitro</italic>. A suggested mechanism involves Nox as a factor that mediates 420-nm IPL-induced oxidative damage of <italic>T. rubrum.</italic></p>